Kometani, Janet: search on Z-Library

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1

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

Nalamasu, Omkaram, Reichmanis, Elsa, Cheng, May, Pol, Victor, Kometani, Janet M., Houlihan, Francis M., Neenan, Thomas X., Bohrer, M. P., Mixon, David A., Thompson, Larry F., Takemoto, Clifford H., It

Year:

1991

Language:

english

File:

PDF, 1.18 MB

english, 1991

2

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Positive chemically amplified resist for deep-UV lithography

Nalamasu, Omkaram, Timko, Allen G., Cheng, May, Kometani, Janet M., Galvin-Donoghue, Mary E., Heffner, Sharon A., Slater, Sydney G., Blakeney, Andrew J., Muenzel, Norbert, Schulz, Reinhard, Holzwarth,

Year:

1993

Language:

english

File:

PDF, 990 KB

english, 1993

3

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Development of a chemically amplified positive resist material for single-layer deep-UV lithography

Nalamasu, Omkaram, Cheng, May, Kometani, Janet M., Vaidya, Sheila, Reichmanis, Elsa, Thompson, Larry F., Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 1.06 MB

english, 1990

4

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Synthesis, characterization, and lithography of α-substituted 2-nitrobenzyl arylsulfonate photo-acid generators with improved resistance to post-exposure bake

Houlihan, Francis M., Chin, Evelyn, Nalamasu, Omkaram, Kometani, Janet M., Neenan, Thomas X., Pangborne, A., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 599 KB

english, 1994

5

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

Tarascon-Auriol, Regine G., Novembre, Anthony E., Tai, Woon W., Fetter, Linus A., Kometani, Janet M., Nalamasu, Omkaram, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 832 KB

english, 1994

6

Structural studies of vinylidene fluoride-tetrafluoroethylene copolymers by nuclear magnetic resonance spectorscopy

Rudolf E. Cais, Janet M. Kometani

Journal:

Analytica Chimica Acta

Year:

1986

Language:

english

File:

PDF, 1020 KB

english, 1986

7

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - 193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids

Houlihan, Francis M., Kometani, Janet M., Timko, Allen G., Hutton, Richard S., Cirelli, Raymond A., Reichmanis, Elsa, Nalamasu, Omkaram, Gabor, Allen H., Medina, Arturo N., Biafore, John J., Slater, S

Year:

1998

Language:

english

File:

PDF, 2.96 MB

english, 1998

8

Synthesis and two-dimensional NMR of highly aregic poly(vinylidene fluoride)

Cais, Rudolf E., Kometani, Janet M.

Journal:

Year:

1985

Language:

english

File:

PDF, 508 KB

english, 1985

9

Compositional variation of the structure and solid-state transformations of vinylidene fluoride/tetrafluoroethylene copolymers

Lovinger, Andrew J., Davis, Don D., Cais, Rudolf E., Kometani, Janet M.

Journal:

Year:

1988

Language:

english

File:

PDF, 1.20 MB

english, 1988

10

SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA, United States (Sunday 22 February 1998)] Advances in Resist Technology and Processing XV - Recent advances in increasing the thermal flow resistance of acetal-derivatized polyhydroxystyrene deep-UV matrix resins

Kometani, Janet M., Houlihan, Francis M., Timko, Allen G., Nalamasu, Omkaram, Reichmanis, Elsa, Heffner, Sharon A., Galvin-Donoghue, Mary E.

Year:

1998

Language:

english

File:

PDF, 1.16 MB

english, 1998

11

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Single-component chemically amplified resist materials for electron-beam and x-ray lithography

Novembre, Anthony E., Tai, Woon W., Kometani, Janet M., Hanson, James E., Nalamasu, Omkaram, Taylor, Gary N., Reichmanis, Elsa, Thompson, Larry F., Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 905 KB

english, 1991

12

Synthesis, characterization, and electrochemical activity of halogen-doped glassy carbon

Hutton, Howard D., Huang, Wenhua, Alsmeyer, Daniel C., Kometani, Janet, McCreery, Richard L., Neenan, Thomas X., Callstrom, Matthew R.

Journal:

Chemistry of Materials

Year:

1993

Language:

english

File:

PDF, 1.99 MB

english, 1993

13

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins

Rushkin, Ilya L., Houlihan, Francis M., Kometani, Janet M., Hutton, Richard S., Timko, Allen G., Reichmanis, Elsa, Nalamasu, Omkaram, Gabor, Allen H., Medina, Arturo N., Slater, Sydney G., Neisser, Ma

Year:

1999

Language:

english

File:

PDF, 1.02 MB

english, 1999

14

Synthesis of pure head-to-tail poly(trifluoroethylenes) and their characterization by 470-MHz fluorine-19 NMR

Cais, Rudolf E., Kometani, Janet M.

Journal:

Year:

1984

Language:

english

File:

PDF, 1.04 MB

english, 1984

15

t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies.

Nalamasu, Omakaram, Novembre, Anthony E., Kometani, Janet M., Hanson, James E.

Journal:

Journal of Photopolymer Science and Technology

Year:

1993

Language:

english

File:

PDF, 778 KB

english, 1993

16

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Advanced positive photoresists for practical deep-UV lithography

Muenzel, Norbert, Holzwarth, Heinz E., Falcigno, Pasquale A., Schacht, Hans-Thomas, Schulz, Reinhard, Nalamasu, Omkaram, Timko, Allen G., Reichmanis, Elsa, Kometani, Janet M., Stone, Douglas R., Neena

Year:

1994

Language:

english

File:

PDF, 689 KB

english, 1994

17

NMR characterization of the chemical microstructure of vinylidene halide and vinyl halide copolymers

Cais, Rudolf E., Kometani, Janet M., Salzman, Nita H.

Journal:

Year:

1986

Language:

english

File:

PDF, 809 KB

english, 1986

18

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters

Schilling, Marcia L., Katz, Howard E., Houlihan, Francis M., Kometani, Janet M., Stein, Susan M., Nalamasu, Omkaram, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 371 KB

english, 1994

19

Annual Chemical Congress: polymer analysis

Gerrard, D. L., Coleman, M. M., Gordon, B., Lehrle, Roy S., McNeill, I. C., Cais, Rudolf E., Kometani, Janet M., Salzman, Nita H.

Journal:

Analytical Proceedings

Year:

1983

Language:

english

File:

PDF, 1.30 MB

english, 1983

20

Photogenerated Acid-Catalyzed Formation of Phosphonic/Phosphoric Acids by Deprotection of Esters in Polymer Films

Schilling, Marcia L., Katz, Howard E., Houlihan, Francis M., Kometani, Janet M., Stein, Susan M., Nalamasu, Omkaram

Journal:

Year:

1995

Language:

english

File:

PDF, 1.87 MB

english, 1995

21

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Dissolution properties of cycloolefin-maleic-anhydride-based resist resins

Rushkin, Ilya L., Houlihan, Francis M., Kometani, Janet M., Hutton, Richard S., Nalamasu, Omkaram, Reichmanis, Elsa, Dimov, Ognian N., Medina, Arturo N., Varlemann, Ulrike, Gabor, Allen H., Sarrubi, T

Year:

2000

Language:

english

File:

PDF, 150 KB

english, 2000

22

New isomers of poly(vinyl fluoride) with controlled regiosequence microstructure

Rudolf E. Cais, Janet M. Kometani

Journal:

Year:

1988

Language:

english

File:

PDF, 480 KB

english, 1988

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